Lub Nplhaib Alumina Ceramic Uas Muaj Peev Xwm Siab Rau CVD / PVD Txheej Txheem Chambers
Lub nplhaib ceramic ntawm St.Cera yog tsim tshwj xeeb rau kev siv hauv CVD (Chemical Vapor Deposition) thiab PVD (Physical Vapor Deposition) cov txheej txheem chambers. Ua los ntawm 99.8% high-purity alumina (Al₂O₃), lub nplhaib no ua haujlwm ua lub chamber liner, focus ring, lossis cov khoom siv txheej txheem los kaw cov plasma thiab tiv thaiv cov phab ntsa chamber los ntawm kev yaig. Cov khoom siv muaj kev tiv thaiv plasma zoo heev, lub zog dielectric siab (15 × 10⁶ V / m), thiab thermal stability txog li 1600 ° C, ua kom muaj kev pabcuam ntev hauv cov chaw plasma uas muaj fluorine. Kev kam rau siab meej (± 0.05 hli ntawm ID / OD) thiab flatness (≤ 10 μm) ua rau muaj kev sib xws ntawm ntug wafer, txhim kho kev sib npaug ntawm cov khoom tso tawm thiab txo cov khoom me me.
Cov Lus Qhia Tshwj Xeeb (raws li 99.8% Al₂O₃):
| Vaj tse | Tus nqi |
| Khoom siv | 99.8% Alumina (Ivory) |
| Qhov Ceev | 3.93 g/cm³ |
| Kev Nqus Dej | 0% |
| Lub zog flexural | 361 MPa |
| Kev tawg tawv | 3–4 MPa·m¹/² |
| Vickers Hardness | 16 GPa |
| Young's Modulus | 380 GPa |
| Kev Ua Kub | 32 W/m·k |
| Kev Nthuav Dav Kub (25–1000 ° C) | 7.2 × 10⁻⁶/℃ |
| Lub zog dielectric | 15 × 10⁶ V/m |
| Kev Tiv Thaiv Tshwj Xeeb | >10¹⁴ Ω·cm |
| Kub Tshaj Plaws Ua Haujlwm | 1600°C |
Cov ntawv thov:
- · CVD chamber tsom iav nplhaib thiab ntug nplhaib
- · PVD chamber shield rings thiab clamp rings
- · Cov ntaub thaiv qhov rai thiab cov rings ntawm lub chamber
- · Cov nplhaib kaw plasma hauv cov kab ke dielectric etch
Txheej Txheem Tsim Khoom:
Isostatic nias → ntsuab machining → sintering ntawm 1600 ° C → CNC ID / OD sib tsoo → nto lapping → ultrasonic ntxuav → 100% CMM tshuaj xyuas. Ultra-du nto tiav (Ra ≤0.4 μm) txo qis cov khoom sib txuas.
Kev Tswj Xyuas Zoo:
- · 100% kev kuaj xyuas qhov ntev (ID, OD, tuab, tiaj tus)
- · Kev tshuaj xyuas cov xim nkag mus rau qhov chaw me me
- · Kev sim lub zog dielectric raws li ASTM D149
- Tsis pom kev hloov pauv lossis porosity hauv qab 20 × lub tshuab microscope
Cov txiaj ntsig zoo dua li Cov Nplhaib Hlau lossis Quartz:
- · Muaj lub neej ntev dua 5–10 × dua li cov nplhaib txhuas hauv cov plasma fluorine
- · Tsis muaj hlau ua qias tuaj rau hauv cov yeeb yaj kiab nyias nyias
- · Kev tiv thaiv plasma ntau dua li quartz (tsis muaj qhov av erosion)
- · Tswj tau qhov rwb thaiv hluav taws xob >10¹⁴ Ω·cm txawm tias siv ntev lawm los xij
Lwm Cov Khoom Siv — Silicon Nitride (Si₃N₄):
Rau cov ntawv thov uas xav tau kev tawv tawv dua (6.2 MPa·m¹/²) thiab kev tiv taus cua sov zoo dua (kev nthuav dav coefficient 3.2 × 10⁻⁶/℃), Si₃N₄ rings muaj. Txawm li cas los xij, alumina pheej yig dua rau feem ntau CVD/PVD daim ntawv thov. Thov qhia meej txog kev nyiam cov khoom siv thaum xaj khoom.
Kev Kho Kom Haum:
- · Cov qhov hla, cov qauv ntaiv, lossis cov qhov counterbores rau kev teeb tsa
- · Y₂O₃-coated nto rau kev txhim kho plasma tsis kam (xaiv tau)
- · Laser engraving ntawm tus lej ib feem / code ntau
Lus Cim:Cov ntaub ntawv saum toj no ua raws li cov lus qhia txog Al₂O₃ uas tau muab los. Rau Si₃N₄ rings, saib daim ntawv qhia txog Si₃N₄ sib cais uas tau muab.








