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Cov Khoom Siv Ceramic rau Cov Khoom Siv Semiconductor Probe
Tsim los ntawm kev nias txias isostatic thiab sintered nyob rau hauv qhov kub siab, tom qab ntawd precision machined thiab polished, cov khoom seem ceramic tuaj yeem ua tau raws li txhua qhov kev cai nruj ntawm cov khoom siv semiconductor nrog nws cov yam ntxwv ntawm kev hnav tsis kam, corrosion tsis kam, thermal nthuav dav tsawg, thiab rwb thaiv tsev. Ceramics tuaj yeem ua haujlwm hauv ntau hom khoom siv semiconductor nrog qhov kub siab, nqus tsev lossis roj corrosive rau lub sijhawm ntev.
Ua los ntawm cov hmoov alumina purity siab, ua tiav los ntawm kev nias txias isostatic, sintering kub siab thiab ua tiav qhov tseeb, nws tuaj yeem ncav cuag qhov ntev kam rau ± 0.001 hli, qhov chaw tiav Ra 0.1, kub tsis kam 1600 ℃.
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Cov Khoom Siv Semiconductor Ceramic Plate
Tsim los ntawm kev nias txias isostatic thiab sintered nyob rau hauv qhov kub siab, tom qab ntawd precision machined thiab polished, cov khoom seem ceramic tuaj yeem ua tau raws li txhua qhov kev cai nruj ntawm cov khoom siv semiconductor nrog nws cov yam ntxwv ntawm kev hnav tsis kam, corrosion tsis kam, thermal nthuav dav tsawg, thiab rwb thaiv tsev. Ceramics tuaj yeem ua haujlwm hauv ntau hom khoom siv semiconductor nrog qhov kub siab, nqus tsev lossis roj corrosive rau lub sijhawm ntev.
Ua los ntawm cov hmoov alumina purity siab, ua tiav los ntawm kev nias txias isostatic, sintering kub siab thiab ua tiav qhov tseeb, nws tuaj yeem ncav cuag qhov ntev kam rau ± 0.001 hli, qhov chaw tiav Ra 0.1, kub tsis kam 1600 ℃.
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Cov Khoom Siv Semiconductor Ceramic Spare Parts
Tsim los ntawm kev nias txias isostatic thiab sintered nyob rau hauv qhov kub siab, tom qab ntawd precision machined thiab polished, cov khoom seem ceramic tuaj yeem ua tau raws li txhua qhov kev cai nruj ntawm cov khoom siv semiconductor nrog nws cov yam ntxwv ntawm kev hnav tsis kam, corrosion tsis kam, thermal nthuav dav tsawg, thiab rwb thaiv tsev. Ceramics tuaj yeem ua haujlwm hauv ntau hom khoom siv semiconductor nrog qhov kub siab, nqus tsev lossis roj corrosive rau lub sijhawm ntev.
Ua los ntawm cov hmoov alumina purity siab, ua tiav los ntawm kev nias txias isostatic, sintering kub siab thiab ua tiav qhov tseeb, nws tuaj yeem ncav cuag qhov ntev kam rau ± 0.001 hli, qhov chaw tiav Ra 0.1, kub tsis kam 1600 ℃.
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Lub nplhaib foob Alumina Ceramic uas muaj purity siab rau kev kaw lub chamber kub siab
St.Cera lub nplhaib foob ceramic yog tsim los ua lwm txoj hauv kev rau polymer O-rings hauv qhov chaw kub heev uas elastomers lwj. Ua los ntawm 99.8% alumina siab-purity (Al₂O₃), lub nplhaib foob ruaj khov no yog siv rau hauv cov ntawv thov sealing static - feem ntau ua ke nrog cov hlau mos lossis graphite gasket - los muab kev tswj hwm lub tshuab nqus tsev lossis roj ntawm qhov kub txog li 800 ° C thiab hauv cov plasma lossis cov chaw tshuaj lom neeg. Cov khoom siv muaj xoom outgassing, lub zog compressive siab (lub zog flexural hauv qab 361 MPa), thiab tshuaj inertness (tiv taus halogens, acids, thiab alkalis tshwj tsis yog HF). Cov chaw sealing precision-lapped (flatness ≤5 μm, surface roughness Ra ≤0.2 μm) ua kom muaj kev sib cuag nrog cov hlau lossis cov khoom ceramic.
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High-Purity Alumina Chamber Focus Ring rau Plasma Etch & CVD Systems
St.Cera lub nplhaib tsom iav chamber yog ib qho khoom siv tseem ceeb uas siv rau hauv cov khoom siv plasma etch, CVD, thiab PVD semiconductor. Ua los ntawm 99.8% alumina uas muaj purity siab (Al₂O₃), lub nplhaib puag ncig ntug wafer kom txwv plasma thiab ua kom zoo dua qhov kev faib tawm ntawm ion, yog li txhim kho qhov sib xws ntawm etch thoob plaws qhov chaw wafer. Cov khoom siv no muaj kev tiv thaiv plasma zoo heev, lub zog dielectric siab (15 × 10⁶ V / m), thiab kev ruaj khov thermal txog li 1600 ° C, ua kom ntseeg tau tias muaj kev ntseeg siab mus sij hawm ntev hauv cov chaw plasma uas muaj fluorine- lossis chlorine. ID / OD thiab qhov tiaj tiaj (≤10 μm) ua rau muaj qhov chaw ntug wafer raug, txo cov qhov tsis zoo ntawm ntug thiab kev tsim cov khoom me me.
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Lub Nplhaib Alumina Ceramic Uas Muaj Peev Xwm Siab Rau CVD / PVD Txheej Txheem Chambers
Lub nplhaib ceramic ntawm St.Cera yog tsim tshwj xeeb rau kev siv hauv CVD (Chemical Vapor Deposition) thiab PVD (Physical Vapor Deposition) cov txheej txheem chambers. Ua los ntawm 99.8% high-purity alumina (Al₂O₃), lub nplhaib no ua haujlwm ua lub chamber liner, focus ring, lossis cov khoom siv txheej txheem los kaw cov plasma thiab tiv thaiv cov phab ntsa chamber los ntawm kev yaig. Cov khoom siv muaj kev tiv thaiv plasma zoo heev, lub zog dielectric siab (15 × 10⁶ V / m), thiab thermal stability txog li 1600 ° C, ua kom muaj kev pabcuam ntev hauv cov chaw plasma uas muaj fluorine. Kev kam rau siab meej (± 0.05 hli ntawm ID / OD) thiab flatness (≤ 10 μm) ua rau muaj kev sib xws ntawm ntug wafer, txhim kho kev sib npaug ntawm cov khoom tso tawm thiab txo cov khoom me me.
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Bernoulli Ceramic End Effector - Kev Tswj Xyuas Wafer Tsis Sib Chwv Rau Cov Wafer Nyias & Fragile
St.Cera's Bernoulli ceramic end effector siv aerodynamic lift los tuav cov wafers yam tsis muaj kev sib cuag. Ua los ntawm cov khoom siv siab-purity 99.8% alumina (Al₂O₃) lossis silicon carbide (SiC), nws muaj cov nozzles precision-machined uas tso cov roj siab los tsim ib daim nyias nyias ntawm qhov kawg effector thiab wafer. Lub hauv paus ntsiab lus tsis sib cuag no tshem tawm cov pa phem sab nraub qaum, ntug chipping, thiab kev puas tsuaj ntawm qhov chaw, ua rau nws zoo tagnrho rau cov wafers nyias (≤100 μm), tawg yooj yim, lossis warped. Lub ceramic substrate muab lub zog flexural siab (361 MPa rau Al₂O₃; txog li 550–600 MPa rau SiC), qhov hnyav tsawg, thiab qhov ruaj khov zoo heev, ua kom ntseeg tau tias rov ua dua qhov chaw hauv cov neeg hlau hloov wafer ceev ceev.
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Cov Khoom Siv Alumina Ceramic Uas Muaj Kev Ntshiab Siab Rau Semiconductor & Kev Siv Hauv Kev Lag Luam
St.Cera tsim cov khoom siv alumina (Al₂O₃) ceramic uas raug tshuab ua kom raug raws li cov neeg siv khoom xav tau. Siv 99.8% alumina uas muaj purity siab, cov khoom no muaj zog flexural zoo heev (361 MPa), hardness siab (16 GPa), thiab dielectric zog zoo heev (15 × 10⁶ V/m). Tsim los rau cov khoom siv semiconductor, cov khoom sib dhos uas tiv taus kev hnav, cov insulators hluav taws xob, thiab cov khoom siv kub siab, cov khoom no muaj kev nqus dej ze li xoom (0%) thiab cov coefficient thermal expansion ntawm 7.2 × 10⁻⁶/℃, ua kom muaj kev ruaj khov ntawm qhov ntev hauv qab qhov xwm txheej hnyav.
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Porous Ceramic Nqus Tsev Chuck rau Warped Wafer Tuav
St.Cera lub porous ceramic chuck yog tsim los ntawm high-purity alumina nrog qhov qhib porosity sib xws ntawm 30–45% thiab qhov loj ntawm pore txij li 10 txog 100 μm. Tsis zoo li cov grooved chucks ib txwm muaj, qhov chaw porous muab lub tshuab nqus tsev faib thoob plaws tag nrho sab nraub qaum ntawm wafer, tuav tau zoo cov wafers warped, nyias, lossis ib leeg yam tsis muaj ntug nqa tawm lossis tawg. Lub tshuab nqus tsev maj mam (hloov kho tau ntawm restrictor) kuj tiv thaiv kev cim sab nraub qaum.
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Alumina-Based Porous Ceramic Vacuum Chuck rau Kev Tswj Xyuas Wafer Nyias
St.Cera lub alumina-based porous chuck yog ua los ntawm 99.6% high-purity Al₂O₃ nrog kev tswj hwm qhov qhib porosity ntawm 30–45% thiab qhov loj ntawm cov pore sib xws ntawm 10 txog 50 μm. Tsis zoo li grooved chucks, qhov chaw porous muab lub tshuab nqus tsev faib thoob plaws tag nrho wafer backside, tshem tawm cov cim ntug thiab ua rau maj mam tuav cov ultra-thin (≤100 μm) lossis warped wafers. Cov khoom siv muab lub zog flexural ≥250 MPa thiab thermal stability txog li 400 ° C hauv huab cua.
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Phaj faib roj alumina rau CVD / PVD Da Dej taub hau
Lub phaj faib roj ntawm St.Cera (lub taub hau da dej) yog ua los ntawm cov khoom siv alumina ceramic uas muaj 99.8% purity siab. Nws muaj ntau qhov me me (qhov loj 0.3–1.5 hli) uas ua kom cov roj ntws zoo ib yam thoob plaws ntawm qhov chaw wafer thaum lub sijhawm CVD, PVD, lossis ALD. Lub zog dielectric siab ntawm lub phaj (>15 × 10⁶ V/m) thiab kev tiv taus plasma ua rau nws tseem ceeb rau kev tso cov zaj duab xis nyias semiconductor.
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Ceramic Supporting Pin rau Semiconductor Process Fixtures
Cov koob txhawb nqa ceramic ntawm St.Cera (tseem hu ua cov koob txhawb nqa lossis cov koob txhawb nqa) yog siv rau hauv cov chav ua haujlwm semiconductor los tsa cov wafers lossis cov substrates thaum tuav, cua sov, lossis txias. Ua los ntawm 99.8% alumina lossis silicon nitride, cov koob no muaj lub zog compressive siab, thermal stability, thiab tshuaj lom neeg tsis kam. Tus qauv hemispherical lossis lub taub hau tiaj tiaj tiv thaiv wafer khawb.
